Tomoki Nagai is a General Manager of the Materials Informatics Initiative at JSR corporation. He has also 20-year experience of semiconductor lithography material development. He graduated with a bachelor’s degree and master’s degree in chemistry from Osaka University in Japan. He also studied photoresist chemistry at the University of Texas as a visiting scientist under the direction of Prof. Willson in 2008 and 2009. He has been also a visiting scientist of the Institute of Statistical Mathematics at Tachikawa, Japan for advanced analytics and is also a visiting scientist of Keio University at Kawasaki, Japan for Quantum Computer work.

He joined JSR in 1999 and has worked for 248 resist, 193 resist, chemical shrink material, double patterning material, EUV resist, DSA material and spin on hardmask materials and now been working for the Materials Informatics. He applied more than 300 patents world wide and more than 150 patents granted. Now he is also a committee member of the Society of the Photopolymer Science and Technology and also the program committee as a vise program chair of the International Microprocesses and Nanotechnology Conference.